Novellus Introduces Sabre(r) 3d Electroplating System For The Advanced Wafer-level Packaging Market

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13th July 2010, 08:51am - Views: 874





Business Company Novellus Systems, Inc. 1 image

Business Company Novellus Systems, Inc. 2 image










MEDIA RELEASE PR40400


Novellus Introduces SABRE(R) 3D Electroplating System for the Advanced Wafer-Level

Packaging Market


SAN JOSE, Calif., July 13 /PRNewswire-AsiaNet/ --


Highly Productive, Modular Platform Delivers Technology to Enable 3D Integration


    Novellus Systems (Nasdaq: NVLS) today introduced the SABRE 3D electroplating

system for the rapidly-growing advanced wafer-level packaging (WLP) market. Utilizing

technology from Novellus' industry-leading SABRE Electrofill(R) copper damascene

interconnect system, SABRE 3D's flexible and modular architecture delivers a range of

high-productivity WLP processes, including copper through-silicon vias (TSV), copper

redistribution layers (RDL), pillars, under-bump metallization, and lead-free micro-

bumping. The new SABRE 3D platform incorporates technological advances specifically

designed to enable the tighter interconnect pitches, higher production yields,

improved uniformities, and reduced costs driven by advanced WLP applications.

TurboCell(TM) technology for high rate electroplating, Advanced Pretreatment

Technology (APT(TM)) for robust wetting, and XMM(TM) overburden reduction are just

some of the new innovations employed by SABRE 3D.



     (Photo: http://www.newscom.com/cgi-bin/prnh/20100712/SF33121)


    Strong demand for more powerful mobile electronics is driving the development of

alternate packaging technologies that enable faster device speeds, increased

functionality and I/O density, lower power consumption, and minimized form factor. 3D

integration has emerged to meet these demands with the promise to be more cost-

effective than conventional 2D scaling and is driving an ever-increasing need for

innovation in WLP applications. 


    SABRE 3D was designed to meet the emerging needs of the advanced WLP market with

an innovative, flexible, and modular architecture that maximizes footprint density,

enables configurable multi-layer processing, and supports field extendibility for

seamless capacity expansion. The field-configurable design also simplifies the

transition from the development environment to high volume manufacturing. SABRE 3D

incorporates many of the same technologies that have made the SABRE platform the

industry-leader in electrochemical deposition reliability and manufacturability.

SABRE's sealed dry contacts, innovative clamshell and cell design, SmartDose(R) bath

control, and precision wafer handling have been integrated into the new SABRE 3D

platform.


    New technology innovations are central to SABRE 3D's benchmark-setting technical

performance and productivity. Through targeted development of Electrofill chemistry

and processes, SABRE 3D delivers void-free TSV fill and improves TSV integration by

reducing thermally-induced via protrusion. Advanced Pretreatment Technology (APT(TM))

ensures robust wetting and consistent fill initiation, resulting in plating times up

to 50 percent faster than competing offerings. Novellus' XMM(TM) technology, an in-

line isotropic wet etch process, enables independent control of plated copper fill

and overburden and reduces CMP cost of consumables by up to 70 percent. Additionally,

Novellus has developed new, proprietary TurboCell(TM) technology for through-resist

plating applications that dramatically improves film uniformity and alloy consistency

while providing exceptionally high plating rates.


Business Company Novellus Systems, Inc. 3 image

    "The new SABRE 3D platform leverages over 12 years of industry-leading

electroplating technology and experience to address the emerging requirements of the

advanced WLP market," said Sesha Varadarajan, vice president and general manager of

Novellus' Electrofill business unit. "SABRE 3D's innovative design and feature set

support a range of applications for 3D integration where technology and cost are

equally important."


    About Novellus' ECD Technology:

    For high-volume manufacturing applications at 45nm and beyond, Novellus' advanced

copper electrochemical deposition hardware, processes, and chemistries combine

industry-leading throughput with bottom-up void-free filling of advanced device

structures. Nine out of ten copper interconnect wafers in the world are manufactured

on Novellus SABRE Electrofill(R) systems.


    About Novellus:

    Novellus Systems, Inc. (NASDAQ: NVLS) is a leading provider of advanced process

equipment for the global semiconductor industry. An S&P 500 company, Novellus is

headquartered in San Jose, Calif. with subsidiary offices across the globe. For more

information, please visit www.novellustechnews.com


    Novellus, SABRE, Electrofill, and SmartDose are registered trademarks; and

TurboCell, APT, and XMM are trademarks of Novellus Systems, Inc.



SOURCE: Novellus Systems, Inc.


    CONTACT:  Bob Climo of Novellus Systems, Inc., 

              + 1-408-943-9700,

              bob.climo@novellus.com; 

 

              or Sarmishta Ramesh of The Hoffman Agency,

              +1-303-327-5459, 

              sramesh@hoffman.com, 

              for Novellus Systems, Inc.


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